| Record ID | marc_loc_updates/v38.i37.records.utf8:11078630:1291 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v38.i37.records.utf8:11078630:1291?format=raw |
LEADER: 01291cam a22003015a 4500
001 2009284505
003 DLC
005 20100909115052.0
008 090626s2007 waua b 101 0 eng d
010 $a 2009284505
020 $a9780819466389
020 $a0819466387
035 $a(OCoLC)ocn144527843
040 $aLHL$cLHL$dBTCTA$dDLC
042 $alccopycat
050 00 $aTK7874$b.A25 2007
245 00 $aAdvances in resist materials and processing technology XXIV :$b26-28 February, 2007, San Jose, California, USA /$cQinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH.
260 $aBellingham, Wash. :$bSPIE,$cc2007.
300 $a2 v. :$bill. ;$c28 cm.
490 1 $aProceedings of SPIE ;$vv. 6519
500 $aPrevious conference proceedings entitled: Advances in resist technology and processing.
504 $aIncludes bibliographical references and author index.
650 0 $aPhotoresists$vCongresses.
650 0 $aMicrolithography$vCongresses.
700 1 $aLin, Qinghuang,$d1963-
710 2 $aSociety of Photo-optical Instrumentation Engineers.
710 2 $aSEMATECH (Organization)
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 6519.