| Record ID | marc_loc_updates/v40.i07.records.utf8:9084123:1006 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v40.i07.records.utf8:9084123:1006?format=raw |
LEADER: 01006nam a22002537a 4500
001 2011276683
003 DLC
005 20120211153148.0
008 120126s2012 maua b 001 0 eng d
010 $a 2011276683
020 $a9781608072132
020 $a1608072134
035 $a(OCoLC)ocn768130712
040 $aVYR$cVYR$dDLC
042 $alccopycat
050 00 $aQC611.S9$bR56 2012
100 1 $aRobertson, Max
245 10 $aSubstrate surface preparation handbook /$bMax Robertson
260 $aNorwood, MA :$bArtech House,$cc2011.
300 $a195 p. :$bill ;$c24 cm.
500 $aIncludes bibliographical references (p. 157-158) and index.
505 0 $aIntroduction -- Preparation : before the start -- Lapping -- Polishing -- Specific processes and materials -- Specialized techniques -- Surface finish -- Optics -- Semiconductor device Deconstruction -- Metallurgical Polishing and Microscopy -- Laboratory Setup -- Using Interferometry.
650 0 $aSemiconductors$xSurfaces.
650 0 $aEpitaxy.