| Record ID | marc_openlibraries_sanfranciscopubliclibrary/sfpl_chq_2018_12_24_run03.mrc:77943972:1705 |
| Source | marc_openlibraries_sanfranciscopubliclibrary |
| Download Link | /show-records/marc_openlibraries_sanfranciscopubliclibrary/sfpl_chq_2018_12_24_run03.mrc:77943972:1705?format=raw |
LEADER: 01705cam a22004574a 4500
001 49679627
003 OCoLC
005 20151005043919.0
008 020418r20021951mdua 000 0aeng
010 $a2002069397
015 $aGBA2-U7901
020 $a0801872111 (alk. paper)
035 $a49679627
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042 $apcc
049 $aSFRA
050 00 $aTS140.L63$bA36 2002
082 00 $a745.2/092$aB$221
092 $a745.2092$bL826n 2002
100 1 $aLoewy, Raymond,$d1893-1986.
245 10 $aNever leave well enough alone /$cby Raymond Loewy ; with a new introduction by Glenn Porter.
260 $aBaltimore :$bJohns Hopkins University Press,$c2002.
300 $axxv, 377 p. :$bill. ;$c19 cm
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
338 $avolume$bnc$2rdacarrier
500 $aOriginally published in 1951 by Simon and Schuster, New York.
600 10 $aLoewy, Raymond,$d1893-1986.
650 0 $aIndustrial designers$vBiography.
856 41 $3Table of contents$uhttp://www.loc.gov/catdir/toc/fy036/2002069397.html
907 $a.b19006044$b11-21-18$c09-08-04
998 $axam$b06-21-07$cm$da $e-$feng$gmdu$h0$i1
957 00 $aOCLC reclamation of 2017-18
907 $a.b19006044$b12-03-14$c09-08-04
956 $aPre-reclamation 001 value: ocm49679627
975 $aSFR
994 $aX0$bSFR
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999 $yMARS
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