| Record ID | marc_records_scriblio_net/part17.dat:56831127:1267 |
| Source | Scriblio |
| Download Link | /show-records/marc_records_scriblio_net/part17.dat:56831127:1267?format=raw |
LEADER: 01267pam 2200289 a 4500
001 84013352
003 DLC
005 19990716000000.0
008 840613s1984 nyua b 001 0 eng
010 $a 84013352
020 $a0306418037
040 $aDLC$cDLC$dDLC
050 00 $aTK7874$b.I5924 1982
082 00 $a621.381/7$219
111 2 $aInternational Symposium on Methods and Materials in Microelectronic Technology$d(1982 :$cBad Neuenahr-Ahrweiler, Germany)
245 10 $aMethods and materials in microelectronic technology /$cedited by Joachim Bargon.
260 $aNew York :$bPlenum Press,$cc1984.
300 $aviii, 367 p. :$bill. ;$c26 cm.
440 4 $aThe IBM research symposia series
500 $a"Proceedings of the International Symposium on Methods and Materials in Microelectronic Technology, held September 29-October 1, 1982, in Bad Neuenahr, Federal Republic of Germany"--T.p. verso.
504 $aIncludes bibliographies and index.
650 0 $aIntegrated circuits$xVery large scale integration$xDesign and construction$xCongresses.
650 0 $aPhotolithography$xCongresses.
650 0 $aIon beam lithography$xCongresses.
650 0 $aX-ray lithography$xCongresses.
700 1 $aBargon, Joachim.
740 0 $aMicroelectronic technology.