| Record ID | marc_records_scriblio_net/part22.dat:155602845:732 |
| Source | Scriblio |
| Download Link | /show-records/marc_records_scriblio_net/part22.dat:155602845:732?format=raw |
LEADER: 00732pam 2200229 a 4500
001 92013625
003 DLC
005 19920921131534.6
008 920408s1992 nyua b 101 0 eng
010 $a 92013625
020 $a0306442078
040 $aDLC$cDLC$dDLC
050 00 $aTA2030$b.P53 1992
082 00 $a621.044$220
245 00 $aPlasma technology :$bfundamentals and applications /$cedited by Mario Capitelli and Claudine Gorse.
260 $aNew York :$bPlenum Press,$cc1992.
300 $aviii, 224 p. :$bill. ;$c25 cm.
504 $aIncludes bibliographical references and index.
650 0 $aPlasma devices$xCongresses.
650 0 $aPlasma (Ionized gases)$xCongresses.
700 10 $aCapitelli, M.
700 10 $aGorse, Claudine.