| Record ID | marc_records_scriblio_net/part22.dat:9949163:895 |
| Source | Scriblio |
| Download Link | /show-records/marc_records_scriblio_net/part22.dat:9949163:895?format=raw |
LEADER: 00895pam 2200265 a 4500
001 91020173
003 DLC
005 19911025131251.5
008 910531s1991 nyua b 00110 eng
010 $a 91020173
020 $a0824785568 (acid-free paper)
040 $aDLC$cDLC$dDLC
050 00 $aQH212.E4$bM87 1991
082 00 $a502/.8/25$220
100 10 $aMurr, Lawrence Eugene.
245 10 $aElectron and ion microscopy and microanalysis :$bprinciples and applications /$cLawrence E. Murr.
250 $a2nd ed., rev. and expanded.
260 0 $aNew York :$bM. Dekker,$cc1991.
300 $axiv, 837 p. :$bill. ;$c27 cm.
490 1 $aOptical engineering ;$v29
504 $aIncludes bibliographical references and indexes.
650 0 $aElectron microscopy.
650 0 $aField ion microscopy.
650 0 $aMicroprobe analysis.
830 0 $aOptical engineering (Marcel Dekker, Inc.) ;$vv. 29.