| Record ID | marc_records_scriblio_net/part23.dat:112420690:882 |
| Source | Scriblio |
| Download Link | /show-records/marc_records_scriblio_net/part23.dat:112420690:882?format=raw |
LEADER: 00882pam 2200253 a 4500
001 93022784
003 DLC
005 19931119081043.0
008 930512s1993 maua b 001 0 eng
010 $a 93022784
020 $a0750691727
040 $aDLC$cDLC$dDLC
050 00 $aQC611.8.S5$bC48 1993
082 00 $a620.1/93$220
245 00 $aCharacterization in silicon processing /$ceditor, Yale Strusser ; contributing editors, C.R. Brundle, Gary E. McGuire ; managing editor, Lee E. Fitzpatrick.
260 $aBoston :$bButterworth-Heinemann ;$aGreenwich :$bManning,$cc1993.
300 $axiii, 240 p. :$bill. ;$c25 cm.
440 0 $aMaterials characterization series
504 $aIncludes bibliographical references and index.
650 0 $aSilicon.
650 0 $aElectric conductors.
650 0 $aSemiconductor films.
650 0 $aSurface chemistry.
700 10 $aStrausser, Yale.