| Record ID | marc_records_scriblio_net/part25.dat:35888333:1503 |
| Source | Scriblio |
| Download Link | /show-records/marc_records_scriblio_net/part25.dat:35888333:1503?format=raw |
LEADER: 01503cam 2200325 a 4500
001 95072312
003 DLC
005 20041026110525.0
008 960516s1996 waua b 101 0 eng d
010 $a 95072312
020 $a0819420999
035 $a(OCoLC)35192949
040 $aMoKL$cMoKL$dDLC
042 $alccopycat
050 04 $aTK7874$b.E48352 1996
082 00 $a621.3815/31$221
245 00 $aElectron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI :$b11-13 March 1996, Santa Clara, California /$cDavid E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
260 $aBellingham, Wash. :$bSPIE,$cc1996.
300 $avii, 412 p. :$bill. ;$c28 cm.
490 1 $aProceedings / SPIE--the International Society for Optical Engineering ;$vv. 2723
504 $aIncludes bibliographic references and index.
650 0 $aIntegrated circuits$xMasks$xCongresses.
650 0 $aLithography, Electron beam$xCongresses.
650 0 $aX-ray lithography$xCongresses.
650 0 $aIon beam lithography$xCongresses.
700 1 $aSeeger, David E.
710 2 $aSociety of Photo-optical Instrumentation Engineers.
710 2 $aSemiconductor Equipment and Materials International.
710 2 $aSEMATECH (Organization)
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 2723.