| Record ID | marc_university_of_toronto/uoft.marc:1861270996:1704 |
| Source | University of Toronto |
| Download Link | /show-records/marc_university_of_toronto/uoft.marc:1861270996:1704?format=raw |
LEADER: 01704cam 2200313 a 4500
005 19980910150835.5
008 921026s1990 njua 100 0 eng d
050 4 $aTS645$b.I57 1990
090 8 $aTS 695 .I57 1990$bENGI$c1
111 2 $aInternational Conference on Chemical Vapor Deposition$n(11th :$d1990 :$cSeattle, Wash.)
245 10 $aCVD-XI :$bproceedings of the Eleventh International Conference on Chemical Vapor Deposition, 1990 /$cedited by Karl E. Spear, G.W. Cullen ; High Temperature Materials, Dielectric Science and Technology, and Electronics Divisions.
260 $aPennington, N.J. :$bElectrochemical Society,$c1990.
300 $axiv, 734 p. :$bill.
490 1 $aProceedings / Electrochemical Society ;$v90-12
500 $aSpine title: Chemical vapor deposition.
500 $a"Part of the October 1990 Meeting of the Electrochemical Society which was held in Seattle, Washington, and was endorsed by the American Ceramic Society"--Preface.
650 0 $aVapor plating$xCongresses.
700 1 $aCullen, Glenn Wherry,$d1931-
700 1 $aSpear, Karl E.
710 2 $aAmerican Ceramic Society.
710 2 $aElectrochemical Society.$bDielectric Science and Technology Division.
710 2 $aElectrochemical Society.$bElectronics Division.
710 2 $aElectrochemical Society.$bHigh Temperature Materials Division.
710 2 $aElectrochemical Society.$bMeeting$n(177th :$d1990 :$cMontréal, Québec)
740 0 $aChemical vapor deposition.
830 0 $aProceedings (Electrochemical Society) ;$v90-12.
948 $a09/11/1998$b07/17/1999
039 $fcsg/csg(csg)
949 $aTS695 .I57 1990$wLC$c1$i31761050856954$d11/9/2000$lSTACKS$mENGI_CSCI$n3$q3$rY$sY$tBOOK$u28/9/1998