Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films

Influence of the deposition conditions on rad ...
Pierre A. Steinmann
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Last edited by WorkBot
January 21, 2010 | History

Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films

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Cover of: Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films
Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films
1990, National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Division, For sale by the National Technical Information Service
Microform in English

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Book Details


Edition Notes

Shipping list no.: 1990-0871-M.

Distributed to depository libraries in microfiche.

Prepared at Lewis Research Center.

"April 1990."

Bibliography: p. 3.

Also available via Internet from the NTRS web site. Address as of 3/23/06: http://ntrs.nasa.gov/archive/nasa/casi.ntrs.nasa.gov/19900011894%5F1990011894.pdf; current access is available via PURL.

Microfiche. [Washington, D.C. : National Aeronautics and Space Administration,] 1990. 1 microfiche.

Published in
[Washington, D.C.], Springfield, Va
Series
NASA technical paper -- 2994.

The Physical Object

Format
Microform
Pagination
7 p.

ID Numbers

Open Library
OL16135233M

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January 21, 2010 Edited by WorkBot add subjects and covers
December 11, 2009 Created by WorkBot add works page