An edition of Optical microlithography XXI (2008)

Optical microlithography XXI

26-29 February 2008, San Jose, California, USA

by

Optical microlithography XXI
Harry J. Levinson, Harry J. Le ...
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Last edited by ImportBot
November 16, 2010 | History
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An edition of Optical microlithography XXI (2008)

Optical microlithography XXI

26-29 February 2008, San Jose, California, USA

by

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Integrated circuits, Congresses, Masks, X-ray lithography, Microlithography, Manufacturing processes
Edition Availability
Cover of: Optical microlithography XXI
Optical microlithography XXI: 26-29 February 2008, San Jose, California, USA
2008, SPIE
in English
  • Not in Library
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Book Details

Edition Notes

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 6924, Proceedings of SPIE--the International Society for Optical Engineering -- v. 6924.

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7874 .O65 2008, TK7874.O65 2008

The Physical Object

Pagination
3 v. :

ID Numbers

Open Library
OL24439131M
ISBN 10
0819471097
ISBN 13
9780819471093
LCCN
2010287642
OCLC/WorldCat
229163483

Source records

Library of Congress MARC record
Better World Books record
Library of Congress MARC record

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November 16, 2010 Created by ImportBot initial import