An edition of Optical microlithography XXIII (2010)

Optical microlithography XXIII

23-25 February 2010, San Jose, California, United States

by and

Optical microlithography XXIII
Mircea V. Dusa, Willard Conley ...
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Last edited by LC Bot
February 15, 2012 | History
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An edition of Optical microlithography XXIII (2010)

Optical microlithography XXIII

23-25 February 2010, San Jose, California, United States

by and

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Integrated circuits, Congresses, Masks, X-ray lithography, Microlithography, Manufacturing processes
Edition Availability
Cover of: Optical microlithography XXIII
Optical microlithography XXIII: 23-25 February 2010, San Jose, California, United States
2010, SPIE
in English

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Book Details

Edition Notes

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 7640, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7640.
Other Titles
Optical microlithography 23, Optical microlithography twenty-three

Classifications

Library of Congress
TK7835 .O6653 2010

The Physical Object

Pagination
2 v. :

Edition Identifiers

Open Library
OL25202754M
ISBN 10
0819480541
ISBN 13
9780819480545
LCCN
2011293385
OCLC/WorldCat
670228821

Work Identifiers

Work ID
OL16506279W

Source records

Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record

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