An edition of Optical microlithography XXIII (2010)

Optical microlithography XXIII

23-25 February 2010, San Jose, California, United States

by and

Optical microlithography XXIII
Mircea V. Dusa, Willard Conley ...
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Last edited by LC Bot
February 15, 2012 | History
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An edition of Optical microlithography XXIII (2010)

Optical microlithography XXIII

23-25 February 2010, San Jose, California, United States

by and

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Integrated circuits, Congresses, Masks, X-ray lithography, Microlithography, Manufacturing processes

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Edition Availability
Cover of: Optical microlithography XXIII
Optical microlithography XXIII: 23-25 February 2010, San Jose, California, United States
2010, SPIE
in English
  • Not in Library
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Book Details

Edition Notes

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 7640, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7640.
Other Titles
Optical microlithography 23, Optical microlithography twenty-three

Classifications

Library of Congress
TK7835 .O6653 2010

The Physical Object

Pagination
2 v. :

ID Numbers

Open Library
OL25202754M
ISBN 10
0819480541
ISBN 13
9780819480545
LCCN
2011293385
OCLC/WorldCat
670228821

Source records

Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record

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