An edition of Extreme ultraviolet (EUV) lithography II (2011)

Extreme ultraviolet (EUV) lithography II

28 February-3 March 2011, San Jose, California, United States

by and

Extreme ultraviolet (EUV) lithography II
Bruno M. La Fontaine, Patrick ...
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Last edited by LC Bot
March 23, 2012 | History
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An edition of Extreme ultraviolet (EUV) lithography II (2011)

Extreme ultraviolet (EUV) lithography II

28 February-3 March 2011, San Jose, California, United States

by and

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Ultraviolet radiation, Congresses, Photolithography, Lasers, Extreme ultraviolet lithography, Optical coatings, Industrial applications
Edition Availability
Cover of: Extreme ultraviolet (EUV) lithography II
Extreme ultraviolet (EUV) lithography II: 28 February-3 March 2011, San Jose, California, United States
2011, SPIE
in English

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Book Details

Edition Notes

"SPIE advanced lithography" --Cover.

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 7969, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7969.

Classifications

Library of Congress
TK7872.M3 E9862 2011

The Physical Object

Pagination
2 v. :

Edition Identifiers

Open Library
OL25253843M
ISBN 10
0819485284
ISBN 13
9780819485281
LCCN
2012360647
OCLC/WorldCat
751794175

Work Identifiers

Work ID
OL16565431W

Source records

Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record

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March 23, 2012 Created by LC Bot import new book