Precursor chemistry of advanced materials

CVD, ALD and nanoparticles

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Last edited by ImportBot
August 2, 2020 | History

Precursor chemistry of advanced materials

CVD, ALD and nanoparticles

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Publish Date
Publisher
Springer
Language
English
Pages
213

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Previews available in: English

Book Details


Table of Contents

Gas-phase thermochemistry and mechanism of organometallic tin oxide CVD precursors / M.D. Allendorf ... [et al.]
Materials chemistry of group 13 nitrides / A. Devi ... [et al.]
Single-source-precursor CVD: Alkoxy and siloxy aluminum hydrides / M. Veith
CVD deposition of binary AlSb and GaSb material films
a single-source approach / S. Schulz
Organometallic precursors for atomic layer deposition / M. Putkonen ... [et al.]
Surface reactivity of transition metal CVD precursors: Towards the control of the nucleation step / P. Serp ... [et al.]
Organometallic and metallo-organic precursors for nanoparticles / M.A. Malik ... [et al.].

Edition Notes

Includes bibliographical references and index.

Published in
Berlin, [London]
Series
Topics in organometallic chemistry -- 9, Topics in organometallic chemistry -- 9.

Classifications

Library of Congress
QD411.7.S94 P74 2005, QD410-412.5TA401-492

The Physical Object

Pagination
xv, 213 p. :
Number of pages
213

Edition Identifiers

Open Library
OL25539187M
Internet Archive
precursorchemist00fisc
ISBN 10
3642056881
ISBN 13
9783642056888
OCLC/WorldCat
665072391

Work Identifiers

Work ID
OL16926472W

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History

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August 2, 2020 Edited by ImportBot import existing book
July 28, 2014 Created by ImportBot import new book