An edition of Interferometric metrology of photomask blanks
(2000)
Interferometric metrology of photomask blanks
approaches using 633 nm wavelength
by C. J. Evans
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"The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2
Publish Date
2000
Publisher
U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology
Language
English
Pages
11
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Interferometric metrology of photomask blanks: approaches using 633 nm wavelength
2000, U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology
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Edition Notes
"December 21, 2000."
Shipping list no.: 2003-0057-M
Includes bibliographical references (p. 10-11)
Microfiche. [Washington, D.C.] : Supt. of Docs., U.S. G.P.O., 2002. 1 microfiche : negative.
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| September 15, 2024 | Edited by MARC Bot | import existing book |
| February 6, 2019 | Created by MARC Bot | import existing book |