An edition of Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V (1986)

Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V

11-12 March, 1986, Santa Clara, California

Electron-beam, X-ray, & ion-beam techniques f ...
Phillip D. Blais, chairman/edi ...
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Last edited by MARC Bot
March 13, 2019 | History
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An edition of Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V (1986)

Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V

11-12 March, 1986, Santa Clara, California

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Publish Date
Publisher
SPIE--the International Society for Optical Engineering
Language
English
Pages
272

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Subjects

Electron beam Lithography, Congresses, Ion beam lithography, X-ray lithography

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Edition Availability
Cover of: Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V
Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V: 11-12 March, 1986, Santa Clara, California
1986, SPIE--the International Society for Optical Engineering
in English
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Book Details

Edition Notes

Includes bibliographical references and index.

Published in
Bellinham, Wash., USA
Series
Proceedings of SPIE--the International Society for Optical Engineering -- v. 632

Classifications

Library of Congress
TK7874 E47 1986

The Physical Object

Pagination
vi, 272 p. :
Number of pages
272

ID Numbers

Open Library
OL16429722M
ISBN 10
089252667

Source records

University of Toronto MARC record

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