An edition of Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V (1986)

Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V

11-12 March, 1986, Santa Clara, California

Electron-beam, X-ray, & ion-beam techniques f ...

Phillip D. Blais, chairman/edi ...

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An edition of Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V (1986)

Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V

11-12 March, 1986, Santa Clara, California

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Publish Date

1986

Publisher

SPIE--the International Society for Optical Engineering

Language

English

Pages

272

Buy this book

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1 Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V: 11-12 March, 1986, Santa Clara, California 1986, SPIE--the International Society for Optical Engineering in English	aaaa Not in Library

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Book Details

Edition Notes

Includes bibliographical references and index.

Published in: Bellinham, Wash., USA
Series: Proceedings of SPIE--the International Society for Optical Engineering -- v. 632

Classifications

Library of Congress: TK7874 E47 1986

The Physical Object

Pagination: vi, 272 p. :
Number of pages: 272

ID Numbers

Open Library: OL16429722M
ISBN 10: 089252667

Source records

University of Toronto MARC record

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Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V

11-12 March, 1986, Santa Clara, California