An edition of Rapid isothermal processing (1989)

Rapid isothermal processing

12-13 October 1989, Santa Clara, California

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Cover of: Rapid isothermal processing by Rajendra Singh, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH.
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Last edited by MARC Bot
April 2, 2019 | History
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An edition of Rapid isothermal processing (1989)

Rapid isothermal processing

12-13 October 1989, Santa Clara, California

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
SPIE
Language
English
Pages
204

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Previews available in: English

Subjects
Semiconductor doping, Heat treatment, Semiconductors, Congresses, Vapor plating

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Edition Availability
Cover of: Rapid isothermal processing
Rapid isothermal processing: 12-13 October 1989, Santa Clara, California
1989, SPIE
in English
Libraries near you: WorldCat

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Book Details

Edition Notes

Includes bibliographical references and index.

Published in
Bellingham, Wash., USA
Series
Proceedings / SPIE--the International Society for Optical Engineering ;, v. 1189, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 1189.

Classifications

Dewey Decimal Class
621.381/52
Library of Congress
TK7871.85 .R343 1990

The Physical Object

Pagination
vi, 204 p. :
Number of pages
204

ID Numbers

Open Library
OL2218019M
ISBN 10
0819402257
LCCN
89043525
Goodreads
3891899

Source records

Scriblio MARC record
Library of Congress MARC record
Internet Archive item record

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April 2, 2019 Created by MARC Bot import existing book