An edition of Optical microlithography XVI (2003)

Optical microlithography XVI

25-28 February 2003, Santa Clara, California, USA

by

Cover of: Optical microlithography XVI by Anthony Yen
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Last edited by MARC Bot
April 3, 2019 | History
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An edition of Optical microlithography XVI (2003)

Optical microlithography XVI

25-28 February 2003, Santa Clara, California, USA

by

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Publish Date
Publisher
SPIE
Language
English
Pages
1764

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Subjects

Integrated circuits, Congresses, Masks, X-ray lithography, Microlithography, Manufacturing processes
Edition Availability
Cover of: Optical microlithography XVI
Optical microlithography XVI: 25-28 February 2003, Santa Clara, California, USA
2003, SPIE
in English

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Book Details

Edition Notes

Includes bibliographical references and index.

Published in
Bellingham, Wash., USA
Series
SPIE proceedings series,, v. 5040, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 5040.
Genre
Congresses.
Other Titles
Optical microlithography sixteen, Optical Microlithography 16

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7872.M3 O685 2004, TK7872.M3.O685 2004, TK7835 .O664 2003

The Physical Object

Pagination
3 v. (xxxi, 1764 p.) :
Number of pages
1764

ID Numbers

Open Library
OL3323613M
ISBN 10
0819448451
LCCN
2004296396
OCLC/WorldCat
52636014
Goodreads
3620312

Source records

Scriblio MARC record
Better World Books record
Library of Congress MARC record
marc_columbia MARC record
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April 3, 2019 Created by MARC Bot import existing book