Patentgesetz und Gebrauchsmustergesetz

systematischer kommentar.

3., erw. Aufl., neu bearb. von Karl Nastelski [et al.]
Patentgesetz und Gebrauchsmustergesetz
Karl Nastelski, Eduard Reimer
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Last edited by MARC Bot
October 13, 2020 | History

Patentgesetz und Gebrauchsmustergesetz

systematischer kommentar.

3., erw. Aufl., neu bearb. von Karl Nastelski [et al.]

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Publish Date
Publisher
C. Heymann
Language
German
Pages
2505

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Edition Availability
Cover of: Patentgesetz und Gebrauchsmustergesetz
Patentgesetz und Gebrauchsmustergesetz: systematischer kommentar.
1968, C. Heymann
in German - 3., erw. Aufl., neu bearb. von Karl Nastelski [et al.]

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Book Details


Edition Notes

Bibliography : p. [xiii]-xix.
First-2d ed. entered under Germany (Federal Republic, 1949- ) Laws, statutes, etc.

Published in
Köln

Classifications

Library of Congress
LAW

The Physical Object

Pagination
xxx, 2505 p.
Number of pages
2505

ID Numbers

Open Library
OL4603556M
LCCN
77366667
OCLC/WorldCat
22562191

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October 13, 2020 Created by MARC Bot import existing book