Advanced etch technology for nanopatterning

13-14 February 2012, San Jose, California, United States

Advanced etch technology for nanopatterning
Ying Zhang, G. S. Oehrlein, Qi ...
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Last edited by MARC Bot
October 28, 2020 | History

Advanced etch technology for nanopatterning

13-14 February 2012, San Jose, California, United States

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Publish Date
Publisher
SPIE
Language
English

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Book Details


Edition Notes

"SPIE Advanced Lithography"--Cover.

"Advanced Etch Technology for Nano[p]atterning Conference (AETNC)"--Intro.

Includes bibliographical references and index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 8328, Proceedings of SPIE--the International Society for Optical Engineering -- v. 8328.
Other Titles
Advanced Etch Technology for Nanopatterning Conference (AETNC), AETNC

Classifications

Library of Congress
TA2020 .A615 2012, QC371 .S67 v. 8328

The Physical Object

Pagination
1 v. (various pagings)

ID Numbers

Open Library
OL30733352M
ISBN 10
0819489840
ISBN 13
9780819489845
LCCN
2012471867
OCLC/WorldCat
797974369

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October 28, 2020 Created by MARC Bot import new book