An edition of Photomask and next-generation lithography mask technology XVI (2009)

Photomask and next-generation lithography mask technology XVI

8-10 April 2009, Yokohama, Japan

by Kunihiro Hosono

Photomask and next-generation lithography mas ...

Kunihiro Hosono, Kunihiro Hoso ...

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An edition of Photomask and next-generation lithography mask technology XVI (2009)

Photomask and next-generation lithography mask technology XVI

8-10 April 2009, Yokohama, Japan

by Kunihiro Hosono

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Publish Date

2009

Publisher

SPIE

Language

English

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1 Photomask and next-generation lithography mask technology XVI: 8-10 April 2009, Yokohama, Japan 2009, SPIE in English 0819476560 9780819476562	aaaa Locate

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Book Details

Edition Notes

Includes bibliographical references and author index.

Published in: Bellingham, Wash
Series: Proceedings of SPIE -- v. 7379, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7379.

Classifications

Dewey Decimal Class: 621.381531
Library of Congress: TK7872.M3 P4626 2009

The Physical Object

Pagination: 1 v. (various pagings)

Edition Identifiers

Open Library: OL31161358M
ISBN 10: 0819476560
ISBN 13: 9780819476562
LCCN: 2010287868
OCLC/WorldCat: 436221828

Work Identifiers

Work ID: OL23313272W

Source records

Library of Congress MARC record

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Photomask and next-generation lithography mask technology XVI

8-10 April 2009, Yokohama, Japan

by Kunihiro Hosono