An edition of Plasma processing of semiconductors (1997)

Plasma processing of semiconductors

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Cover of: Plasma processing of semiconductors by NATO Advanced Study Institute on Plasma Processing of Semiconductors (1996 Bonas, France), NATO Advanced Study Institute on Plasma Processing of Semiconductors (1996 Bonas, France)
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Last edited by Open Library Bot
April 28, 2010 | History
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An edition of Plasma processing of semiconductors (1997)

Plasma processing of semiconductors

by

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Publish Date
Publisher
Kluwer Academic Publishers
Language
English
Pages
613

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Subjects

Industrial applications, Plasma chemistry, Etching, Plasma etching, Plasma engineering, Semiconductors

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Edition Availability
Cover of: Plasma processing of semiconductors
Plasma processing of semiconductors
1997, Kluwer Academic Publishers
in English
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Book Details

Edition Notes

Includes bibliographical references and index.
"Proceedings of the NATO Advanced Study Institute on Plasma Processing of Semiconductors, Château de Bonas, France, 17-18-June, 1996"--T.p. verso.
"Published in cooperation with the NATO Scientific Affairs Division."

Published in
Dordrecht, Boston
Series
NATO ASI series. Series E., Applied sciences ;, vol. 336, NATO ASI series., no. 336.

Classifications

Dewey Decimal Class
621.3815/2
Library of Congress
TA2020 .P532 1997

The Physical Object

Pagination
x, 613 p. :
Number of pages
613

ID Numbers

Open Library
OL670674M
ISBN 10
0792345673
LCCN
97016609
Goodreads
5115294

Source records

Scriblio MARC record
Library of Congress MARC record

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History

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April 28, 2010 Edited by Open Library Bot Linked existing covers to the work.
February 6, 2010 Edited by WorkBot add more information to works
December 10, 2009 Created by WorkBot add works page