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This book covers all aspects of Physical Vapor Deposition (PVD) process technology, from the characterization and preparation of the substrate material to post deposition processing. It emphasizes the aspects of the process flow critical to economical deposition of films that can meet the required performance specifications.
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Previews available in: English
Edition | Availability |
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Handbook of physical vapor deposition (PVD) processing: film formation, adhesion, surface preparation and contamination control
1998, Noyes Publications
in English
0815514220 9780815514220
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Edition Notes
Includes bibliographical references and index.
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