An edition of Chemical Vapor Deposition for Microelectronics
(1987)
Chemical Vapor Deposition for Microelectronics
Principles, Technology, and Applications (Materials Science and Process Technology)
by Arthur Sherman
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| Edition | Availability |
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1
Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology)
March 1, 1988, Noyes Publications
Hardcover
in English
0815511361 9780815511366
|
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2
Chemical vapor deposition for microelectronics: principles, technology, and applications
1987, Noyes Publications
in English
0815511361 9780815511366
|
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Libraries near you:
WorldCat
|
Book Details
First Sentence
"Chemical vapor deposition (CVD) is a process where one or more gaseous species react on a solid surface and one of the reaction products is a solid phase material."
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| November 5, 2020 | Edited by MARC Bot | import existing book |
| July 31, 2020 | Edited by ImportBot | import existing book |
| December 4, 2010 | Edited by Open Library Bot | Added subjects from MARC records. |
| April 28, 2010 | Edited by Open Library Bot | Linked existing covers to the work. |
| December 10, 2009 | Created by WorkBot | add works page |