An edition of Interlaboratory study on linewidth measurements for antireflective chromium photomasks
(1982)
Interlaboratory study on linewidth measurements for antireflective chromium photomasks
by John M. Jerke
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Last edited by Open Library Bot
December 4, 2010 | History
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Subjects
Integrated circuits, Masks, Optical measurementsShowing 2 featured editions. View all 2 editions?
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1
Interlaboratory study on linewidth measurements for antireflective chromium photomasks
1982, National Bureau of Standards
in English
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2
Interlaboratory study on linewidth measurements for antireflective chromium photomasks
1982, U.S. Dept. of Commerce, National Bureau of Standards, For sale by the Supt. of Docs., U.S. G.P.O.
in English
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Book Details
Edition Notes
Sponsored jointly by NBS and the Defense Advanced Research Projects Agency, Arlington, VA.
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| December 4, 2010 | Edited by Open Library Bot | Added subjects from MARC records. |
| December 10, 2009 | Created by WorkBot | add works page |