Photomask and next-generation lithography mask technology X

16-18 April, 2003, Yokohama, Japan

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Last edited by ImportBot
August 1, 2020 | History

Photomask and next-generation lithography mask technology X

16-18 April, 2003, Yokohama, Japan

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Publish Date
Publisher
SPIE
Language
English
Pages
1066

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Previews available in: English

Book Details


Edition Notes

Includes bibliographical references and author index.
Some earlier proceedings have title: Photomask and X-ray mask technology.

Published in
Bellingham, Wash
Series
SPIE proceedings series ;, v. 5130, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 5130.
Genre
Congresses.
Other Titles
Photomask and X-ray mask technology

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7878 .P565 2003, TK7878.P565 2003

The Physical Object

Pagination
xxi, 1066 p. :
Number of pages
1066

Edition Identifiers

Open Library
OL3320271M
Internet Archive
photomasknextgen5130unse
ISBN 10
0819449962
LCCN
2004272211
OCLC/WorldCat
53173174
Goodreads
3037526

Work Identifiers

Work ID
OL5748747W

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History

Download catalog record: RDF / JSON
August 1, 2020 Edited by ImportBot import existing book
December 5, 2010 Edited by Open Library Bot Added subjects from MARC records.
April 28, 2010 Edited by Open Library Bot Linked existing covers to the work.
December 10, 2009 Created by WorkBot add works page