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Previews available in: English
Edition | Availability |
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1
Photomask and next-generation lithography mask technology X: 16-18 April, 2003, Yokohama, Japan
2003, SPIE
in English
0819449962 9780819449962
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Book Details
Edition Notes
Includes bibliographical references and author index.
Some earlier proceedings have title: Photomask and X-ray mask technology.
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August 1, 2020 | Edited by ImportBot | import existing book |
December 5, 2010 | Edited by Open Library Bot | Added subjects from MARC records. |
April 28, 2010 | Edited by Open Library Bot | Linked existing covers to the work. |
December 10, 2009 | Created by WorkBot | add works page |