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Last edited anonymously
April 29, 2008 | History
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Stephen M. Rossnagel

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7 works Add another?

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  • Cover of: Author and Subject Cumulative Index, Including Tables of Contents Volumes 1-24, Volume 25: Subject and Author Cumulative Index, Volumes 1-24 (Thin Films)

    First published in 1998 3 editions in 1 language — 1 previewable
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  • Cover of: Handbook of Ion Beam Processing Technology: Principles, Depostion, Film Modification and Synthesis (Materials Science & Process Technology S.) (Materials Science & Process Technology)

    First published in 1989 3 editions in 1 language — 1 previewable
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  • Cover of: Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions (Materials Science and Process Technology)

    First published in 1990 2 editions in 1 language — 1 previewable
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  • Cover of: PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing

    First published in 1998 1 edition in 1 language
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  • Cover of: Non-Crystalline Films for Device Structures

    First published in 2001 1 edition in 1 language
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  • Cover of: Handbook of ion beam processing technology: principles, deposition, film modification, and synthesis

    First published in 1989 1 edition in 1 language
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  • Cover of: Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions

    First published in 1990 1 edition in 1 language — 1 previewable
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We need a photo of Stephen M. Rossnagel

Subjects
Etching, Industrial applications, Ion bombardment, Ion implantation, Plasma engineering, Plasma etching, Semiconductors, Thin films, Attaque chimique, Biology, Chemistry, Electric engineering, Gravure par plasma, Materials, Materials science, Mechanical, Metallurgy, Microelectronics, Physics, Plasma (ionized gases), Plasma dynamics, Professional, career & trade -> electronics -> general, Semi-conducteurs, Technique des plasmas, Trades & technology -> industrial technology -> materials science

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ID Numbers

  • OLID: OL2848982A

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History

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April 29, 2008 Created by an anonymous user initial import