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Last edited anonymously
April 30, 2008 | History

John L. Vossen

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  • Cover of: Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films)

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  • Cover of: Physics of thin films: Advances in research and development.

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  • Cover of: Physics of thin films: advances in research and development.

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  • Cover of: Thin film processes II

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  • Cover of: Physics of Thin Films, Volume 17: Volume 17 (Thin Films)

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  • Cover of: Physics of thin films: advances in research and development.

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  • Cover of: Mechanic and Dielectric Properties: Advances in Research and Development

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  • Cover of: Optical Characterization of Real Surfaces and Films: Advances in Research and Development

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  • Cover of: Thin Films for Emerging Applications

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  • Cover of: Plasma Sources for Thin Film Deposition and Etching

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  • Cover of: Advances in research and development: heterojunctions for high-speed and infrared applications

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  • Cover of: Plasma Sources for Thin Film Deposition and Etching (Physics of Thin Films Volume 18)

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  • Cover of: Thin film processes
    First published in 1978 1 edition in 1 language — 1 previewable

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  • Cover of: Physics of thin films

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April 30, 2008 Created by an anonymous user initial import