Gate stack and silicide issues in silicon processing II

symposium held April 17-19, 2001, San Francisco, California, U.S.A.

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Last edited by MARC Bot
July 31, 2019 | History

Gate stack and silicide issues in silicon processing II

symposium held April 17-19, 2001, San Francisco, California, U.S.A.

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Publish Date
Language
English

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Previews available in: English

Book Details


Edition Notes

Includes bibliographical references and indexes.

Published in
Warrendale, PA
Series
Materials Research Society symposium proceedings -- v. 670, Materials Research Society symposia proceedings -- v. 670.
Genre
Congresses.
Other Titles
Gate stack and silicide issues in silicon processing 2, Gate stack and silicide issues in silicon processing two

Classifications

Dewey Decimal Class
621.39/5
Library of Congress
TK7874.76 .G3823 2002

The Physical Object

Pagination
1 v. (various pagings) :

ID Numbers

Open Library
OL22434473M
ISBN 10
1558996060
LCCN
2002141577

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
July 31, 2019 Edited by MARC Bot associate edition with work OL8245851W
April 13, 2010 Edited by Open Library Bot Linked existing covers to the edition.
November 13, 2008 Created by ImportBot Imported from Binghamton University MARC record