Photomask and next-generation lithography mask technology VII

12-13 April 2000, Yokohama, Japan

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Last edited by MARC Bot
July 13, 2024 | History

Photomask and next-generation lithography mask technology VII

12-13 April 2000, Yokohama, Japan

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Publish Date
Publisher
SPIE
Language
English
Pages
750

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Previews available in: English

Book Details


Edition Notes

Includes bibliographical references and index.
Earlier proceedings have title: Photomask and X-ray mask technology.

Published in
Bellingham, Wash., USA
Series
SPIE proceedings series ;, v. 4066, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 4066.
Genre
Congresses.
Other Titles
Photomask and next generation lithography mask technology VII, Photomask and x-ray mask technology.

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7872.M3 P46 2000,

The Physical Object

Pagination
xv, 750 p. :
Number of pages
750

ID Numbers

Open Library
OL3963006M
Internet Archive
photomasknextgen4066unse
ISBN 10
0819437026
LCCN
2001267210
OCLC/WorldCat
45032912
Goodreads
3037524

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
July 13, 2024 Edited by MARC Bot import existing book
May 27, 2023 Edited by ImportBot import existing book
December 4, 2020 Edited by MARC Bot import existing book
October 8, 2020 Edited by ImportBot import existing book
April 1, 2008 Created by an anonymous user Imported from Scriblio MARC record