An edition of Principles of chemical vapor deposition
(2003)
Principles of Chemical Vapor Deposition
1 edition
by Daniel Mark Dobkin, D.M. Dobkin, and M.K. Zuraw
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Subjects
Vapor-plating, Refractory coating, Engineering: general, Metals technology / metallurgy, Engineering - Industrial, Science, Technology & Industrial Arts, Science/Mathematics, Technical & Manufacturing Trades, Physics, Technology / Material Science, Technology / Technical & Manufacturing Industries & Trades, Chemistry - General, Material Science| Edition | Availability |
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1
Principles of chemical vapor deposition
2003, Kluwer Academic Publishers
in English
1402012489 9781402012488
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2
Principles of Chemical Vapor Deposition
April 1, 2003, Springer
Hardcover
in English
- 1 edition
1402012489 9781402012488
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Book Details
First Sentence
"Inside most any semiconductor fabrication facility in the world at any given moment, there are operators and engineers standing in front of machines with shiny stainless steel facades, loading and unloading cassettes of wafers with complex patterns of dopants, defects, and films on their surfaces."
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History
- Created April 29, 2008
- 5 revisions
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| July 31, 2019 | Edited by MARC Bot | associate edition with work OL12345215W |
| April 24, 2010 | Edited by Open Library Bot | Fixed duplicate goodreads IDs. |
| April 16, 2010 | Edited by bgimpertBot | Added goodreads ID. |
| April 14, 2010 | Edited by Open Library Bot | Linked existing covers to the edition. |
| April 29, 2008 | Created by an anonymous user | Imported from amazon.com record |