| Record ID | ia:isbn_0892525061_471 |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/isbn_0892525061_471/isbn_0892525061_471_marc.xml |
| Download MARC binary | https://www.archive.org/download/isbn_0892525061_471/isbn_0892525061_471_meta.mrc |
LEADER: 01052cam a2200229 a 4500
001 84050821
003 DLC
005 19850930000000.0
008 850401s1984 waua 10000 eng
010 $a 84050821 //r85
020 $a0892525061 (pbk.)
050 0 $aTK7874$b.E482 1984
082 0 $a621.3815/2$219
245 00 $aElectron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III :$bMarch 15-16, 1984, Santa Clara, California /$cAlfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
260 0 $aBellingham, Wash., USA :$bSPIE--the International Society for Optical Engineering,$cc1984.
300 $avi, 136 p. :$bill. ;$c28 cm.
440 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 471
650 0 $aX-ray lithography$xCongresses.
650 0 $aLithography, Electron beam$xCongresses.
650 0 $aIon beam lithography$xCongresses.
700 10 $aWagner, Alfred,$d1950-
710 20 $aInternational Society for Hybrid Microelectronics.