| Record ID | marc_loc_2016/BooksAll.2016.part33.utf8:159092158:1428 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part33.utf8:159092158:1428?format=raw |
LEADER: 01428cam a22003257a 4500
001 2006271122
003 DLC
005 20060706122155.0
008 060112s2005 waua b 101 0 eng d
010 $a 2006271122
020 $a0819457310 (pbk.)
035 $a(OCoLC)ocm60522423
040 $aLHL$cLHL$dOCL$dCLU$dIXA$dDLC
042 $alccopycat
050 00 $aTK7874$b.E5269 2005
082 00 $a621.3815/31$222
245 00 $aEmerging lithographic technologies IX :$b1-3 March 2005, San Jose, California, USA /$cR. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH.
260 $aBellingham, Wash. :$bSPIE,$cc2005.
300 $a2 v. (xviii, 1244 p.) :$bill. (some col.) ;$c28 cm.
490 1 $aProceedings of SPIE,$x0277-786X ;$vv. 5751
504 $aIncludes bibliographical references and author index.
650 0 $aLithography, Electron beam$vCongresses.
650 0 $aMicrolithography$xIndustrial applications$vCongresses.
650 0 $aX-ray lithography$vCongresses.
650 0 $aX-rays$xIndustrial applications$vCongresses.
650 0 $aMasks (Electronics)$vCongresses.
700 1 $aMackay, R. Scott.
710 2 $aSociety of Photo-optical Instrumentation Engineers.
710 2 $aInternational SEMATECH.
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 5751.