| Record ID | marc_loc_2016/BooksAll.2016.part35.utf8:52787934:1408 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part35.utf8:52787934:1408?format=raw |
LEADER: 01408cam a22003257a 4500
001 2007533259
003 DLC
005 20070925130029.0
008 070503s2006 waua b 101 0 eng d
010 $a 2007533259
020 $a0819461946
020 $a9780819461940
035 $a(OCoLC)ocm69860333
040 $aLHL$cLHL$dIXA$dDLC
042 $alccopycat
050 00 $aTK7874$b.E527 2006
245 00 $aEmerging lithographic technologies X :$b21-23 February, 2006, San Jose, California, USA /$cMichael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA).
260 $aBellingham, Wash. :$bSPIE,$cc2006.
300 $a2 v. :$bill. (some col.) ;$c28 cm.
490 1 $aProceedings of SPIE$vv. 6151
504 $aIncludes bibliographical references and author index.
650 0 $aLithography, Electron beam$vCongresses.
650 0 $aMicrolithography$xIndustrial applications$vCongresses.
650 0 $aX-ray lithography$vCongresses.
650 0 $aX-rays$xIndustrial applications$vCongresses.
650 0 $aMasks (Electronics)$vCongresses.
700 1 $aLercel, Michael J.$q(Micheal James),$d1969-
710 2 $aSociety of Photo-optical Instrumentation Engineers.
710 2 $aInternational SEMATECH.
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 6151.