| Record ID | marc_loc_updates/v38.i26.records.utf8:32294780:1464 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v38.i26.records.utf8:32294780:1464?format=raw |
LEADER: 01464nam a22003497a 4500
001 2010455661
003 DLC
005 20100626162618.0
008 100626m20099999waua b 101 0 eng d
010 $a 2010455661
020 $a9780819475244
020 $a0819475246
035 $a(OCoLC)ocn355813963
040 $aSCW$cSCW$dSCW$dBTCTA$dDLC
042 $alccopycat
050 00 $aTK7872.M3$b.A48 2009
245 00 $aAlternative lithographic technologies :$b24-26 February 2009, San Jose, California, United States /$cFrank M. Schellenberg, Bruno M. La Fontaine, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc.
260 $aBellingham, Wash. :$bSPIE,$cc2009-
300 $av. <2> :$bill. ;$c28 cm.
490 1 $aProceedings of SPIE,$x0277-786X ;$vv. 7271
500 $aPrevious conference proceedings entitled: Emerging lithographic technologies.
504 $aIncludes bibliographical references and author index.
650 0 $aExtreme ultraviolet lithography$vCongresses.
650 0 $aLithography, Electron beam$vCongresses.
650 0 $aMicrolithography$xIndustrial applications$vCongresses.
650 0 $aMasks (Electronics)$vCongresses.
700 1 $aSchellenberg, F. M.,$d1959-
700 1 $aLa Fontaine, Bruno M.
710 2 $aSPIE (Society)
710 2 $aInternational SEMATECH.
740 0 $aEmerging lithographic technologies.
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 7271.