An edition of Principles of chemical vapor deposition
(2003)
Principles of Chemical Vapor Deposition
1 edition
by Daniel Mark Dobkin, D.M. Dobkin, and M.K. Zuraw
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Subjects
Vapor-plating, Refractory coating, Engineering: general, Metals technology / metallurgy, Engineering - Industrial, Science, Technology & Industrial Arts, Science/Mathematics, Technical & Manufacturing Trades, Physics, Technology / Material Science, Technology / Technical & Manufacturing Industries & Trades, Chemistry - General, Material Science| Edition | Availability |
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1
Principles of chemical vapor deposition
2003, Kluwer Academic Publishers
in English
1402012489 9781402012488
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2
Principles of Chemical Vapor Deposition
April 1, 2003, Springer
Hardcover
in English
- 1 edition
1402012489 9781402012488
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Book Details
First Sentence
"Inside most any semiconductor fabrication facility in the world at any given moment, there are operators and engineers standing in front of machines with shiny stainless steel facades, loading and unloading cassettes of wafers with complex patterns of dopants, defects, and films on their surfaces."
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| July 31, 2019 | Edited by MARC Bot | associate edition with work OL12345215W |
| January 23, 2010 | Edited by WorkBot | add more information to works |
| December 11, 2009 | Created by WorkBot | add works page |