An edition of Advances in resist materials and processing technology XXIV (2007)

Advances in resist materials and processing technology XXIV

26-28 February, 2007, San Jose, California, USA

by

Advances in resist materials and processing t ...
Qinghuang Lin, Qinghuang Lin
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Last edited by ImportBot
December 3, 2010 | History
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An edition of Advances in resist materials and processing technology XXIV (2007)

Advances in resist materials and processing technology XXIV

26-28 February, 2007, San Jose, California, USA

by

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Photoresists, Congresses, Microlithography
Edition Availability
Cover of: Advances in resist materials and processing technology XXIV
Advances in resist materials and processing technology XXIV: 26-28 February, 2007, San Jose, California, USA
2007, SPIE
in English

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Book Details

Edition Notes

Previous conference proceedings entitled: Advances in resist technology and processing.

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 6519, Proceedings of SPIE--the International Society for Optical Engineering -- v. 6519.

Classifications

Library of Congress
TK7874 .A25 2007

The Physical Object

Pagination
2 v. :

ID Numbers

Open Library
OL24490953M
ISBN 10
0819466387
ISBN 13
9780819466389
LCCN
2009284505
OCLC/WorldCat
144527843

Source records

Library of Congress MARC record

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December 3, 2010 Created by ImportBot initial import