An edition of Alternative lithographic technologies (2009)

Alternative lithographic technologies

24-26 February 2009, San Jose, California, United States

by and

Alternative lithographic technologies
F. M. Schellenberg, Bruno M. L ...
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Last edited by LC Bot
October 27, 2011 | History
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An edition of Alternative lithographic technologies (2009)

Alternative lithographic technologies

24-26 February 2009, San Jose, California, United States

by and

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Electron beam Lithography, Congresses, Microlithography, Masks (Electronics), Industrial applications, Extreme ultraviolet lithography
Edition Availability
Cover of: Alternative lithographic technologies
Alternative lithographic technologies: 24-26 February 2009, San Jose, California, United States
2009, SPIE
in English

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Book Details

Edition Notes

Previous conference proceedings entitled: Emerging lithographic technologies.

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 7271, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7271.
Other Titles
Emerging lithographic technologies.

Classifications

Library of Congress
TK7872.M3 .A48 2009

The Physical Object

Pagination
v. <2> :

Edition Identifiers

Open Library
OL24544997M
ISBN 10
0819475246
ISBN 13
9780819475244
LCCN
2010455661
OCLC/WorldCat
355813963

Work Identifiers

Work ID
OL15594169W

Source records

Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record

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History

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October 27, 2011 Edited by LC Bot import new book
December 16, 2010 Created by ImportBot initial import