An edition of SiGe and Si strained-layer epitaxy for silicon heterostructure devices (2008)

SiGe and Si strained-layer epitaxy for silicon heterostructure devices
Cover of: SiGe and Si strained-layer epitaxy for silicon heterostructure devices by edited by John D. Cressler.
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Last edited by ImportBot
July 29, 2014 | History
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An edition of SiGe and Si strained-layer epitaxy for silicon heterostructure devices (2008)

SiGe and Si strained-layer epitaxy for silicon heterostructure devices

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Publish Date
Publisher
CRC Press/Taylor & Francis
Language
English

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Previews available in: English

Subjects

Silicon, Materials, Epitaxy, Electric properties, Bipolar transistors, Heterostructures
Edition Availability
Cover of: SiGe and Si strained-layer epitaxy for silicon heterostructure devices
SiGe and Si strained-layer epitaxy for silicon heterostructure devices
2008, CRC Press/Taylor & Francis
in English

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Book Details

Edition Notes

"The material was previously published in Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy, Taylor and Francis, 2005"--T.p. verso.

Includes bibliographical references and index.

Published in
Boca Raton
Other Titles
Silicon heterostructure handbook.

Classifications

Dewey Decimal Class
621.3815/28
Library of Congress
TK7871.96.B55 S53 2008

The Physical Object

Pagination
1 v. (various pagings) :

ID Numbers

Open Library
OL18277270M
Internet Archive
sigesistrainedla00cres
ISBN 10
1420066854
ISBN 13
9781420066852
LCCN
2007030343
Goodreads
2795874

Source records

Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record
Library of Congress MARC record
Internet Archive item record

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July 29, 2014 Created by ImportBot import new book