Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI

11-13 March 1996, Santa Clara, California

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read
Not in Library

My Reading Lists:

Create a new list

Check-In

×Close
Add an optional check-in date. Check-in dates are used to track yearly reading goals.
Today

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

Buy this book

Last edited by ImportBot
July 31, 2020 | History

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI

11-13 March 1996, Santa Clara, California

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

This edition doesn't have a description yet. Can you add one?

Publish Date
Publisher
SPIE
Language
English
Pages
412

Buy this book

Book Details


Edition Notes

Includes bibliographic references and index.

Published in
Bellingham, Wash
Series
Proceedings / SPIE--the International Society for Optical Engineering ;, v. 2723, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 2723.

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7874 .E48352 1996, TK7874.E48352 1996

The Physical Object

Pagination
vii, 412 p. :
Number of pages
412

ID Numbers

Open Library
OL820467M
ISBN 10
0819420999
LCCN
95072312
OCLC/WorldCat
35192949
Goodreads
4681575

Community Reviews (0)

Feedback?
No community reviews have been submitted for this work.

Lists

This work does not appear on any lists.

History

Download catalog record: RDF / JSON
July 31, 2020 Edited by ImportBot import existing book
February 11, 2019 Edited by MARC Bot import existing book
February 5, 2019 Created by MARC Bot import existing book