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Previews available in: English
Edition | Availability |
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Photomask and next-generation lithography mask technology VII: 12-13 April 2000, Yokohama, Japan
2000, SPIE
in English
0819437026 9780819437020
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Book Details
Edition Notes
Includes bibliographical references and index.
Earlier proceedings have title: Photomask and X-ray mask technology.
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The Physical Object
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Feedback?July 13, 2024 | Edited by MARC Bot | import existing book |
July 31, 2020 | Edited by ImportBot | import existing book |
February 5, 2019 | Created by MARC Bot | import existing book |