Photomask and next-generation lithography mask technology VII

12-13 April 2000, Yokohama, Japan

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Last edited by MARC Bot
July 13, 2024 | History

Photomask and next-generation lithography mask technology VII

12-13 April 2000, Yokohama, Japan

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Publish Date
Publisher
SPIE
Language
English
Pages
750

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Previews available in: English

Book Details


Edition Notes

Includes bibliographical references and index.
Earlier proceedings have title: Photomask and X-ray mask technology.

Published in
Bellingham, Wash., USA
Series
SPIE proceedings series ;, v. 4066, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 4066.
Genre
Congresses.
Other Titles
Photomask and next generation lithography mask technology VII, Photomask and x-ray mask technology.

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7872.M3 P46 2000,

The Physical Object

Pagination
xv, 750 p. :
Number of pages
750

ID Numbers

Open Library
OL3963006M
Internet Archive
photomasknextgen4066unse
ISBN 10
0819437026
LCCN
2001267210
OCLC/WorldCat
45032912
Goodreads
3037524

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History

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July 13, 2024 Edited by MARC Bot import existing book
July 31, 2020 Edited by ImportBot import existing book
February 5, 2019 Created by MARC Bot import existing book