An edition of Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III (1984)

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III

March 15-16, 1984, Santa Clara, California

Cover of: Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III by Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
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Last edited by ImportBot
July 30, 2023 | History
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An edition of Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III (1984)

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III

March 15-16, 1984, Santa Clara, California

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Publish Date
Publisher
SPIE--the International Society for Optical Engineering
Language
English
Pages
136

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Previews available in: English

Subjects

Electron beam Lithography, Congresses, Ion beam lithography, X-ray lithography
Edition Availability
Cover of: Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III: March 15-16, 1984, Santa Clara, California
1984, SPIE--the International Society for Optical Engineering
in English

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Book Details

Edition Notes

Published in
Bellingham, Wash., USA
Series
Proceedings of SPIE--the International Society for Optical Engineering ;, v. 471

Classifications

Dewey Decimal Class
621.3815/2
Library of Congress
TK7874 .E482 1984

The Physical Object

Pagination
vi, 136 p. :
Number of pages
136

Edition Identifiers

Open Library
OL2870262M
Internet Archive
isbn_0892525061_471
ISBN 10
0892525061
LCCN
84050821
Goodreads
2755430

Work Identifiers

Work ID
OL19182202W

Source records

Scriblio MARC record
Library of Congress MARC record
Internet Archive item record

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July 30, 2023 Edited by ImportBot import existing book
March 11, 2019 Created by MARC Bot import existing book