An edition of Metrology, inspection, and process control for microlithography XVI (2002)

Metrology, inspection, and process control for microlithography XVI

4-7 March, 2002, Santa Clara, [California] USA

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Cover of: Metrology, inspection, and process control for microlithography XVI by Daniel J. C. Herr
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Last edited by ImportBot
July 5, 2023 | History
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An edition of Metrology, inspection, and process control for microlithography XVI (2002)

Metrology, inspection, and process control for microlithography XVI

4-7 March, 2002, Santa Clara, [California] USA

by

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Publish Date
Publisher
SPIE
Language
English
Pages
1204

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Previews available in: English

Subjects

Congresses, Measurement, Process control, Inspection, Microlithography, Integrated circuits
Edition Availability
Cover of: Metrology, inspection, and process control for microlithography XVI
Metrology, inspection, and process control for microlithography XVI: 4-7 March, 2002, Santa Clara, [California] USA
2002, SPIE
in English
Libraries near you: WorldCat

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Book Details

Edition Notes

Includes bibliographical references and author index.

Published in
Bellingham, Washington
Series
SPIE proceedings series ;, v. 4689, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 4689.
Genre
Congresses.

Classifications

Library of Congress
TK7874 .M43763 2002, TK7874.M43763 2002

The Physical Object

Pagination
2 v. (xl, 1204 p.) :
Number of pages
1204

ID Numbers

Open Library
OL3701987M
ISBN 10
0819444359
LCCN
2003268492
OCLC/WorldCat
50505072

Source records

Scriblio MARC record
Better World Books record
Library of Congress MARC record
Internet Archive item record
Internet Archive item record
marc_columbia MARC record

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History

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July 5, 2023 Edited by ImportBot import existing book
April 3, 2019 Created by MARC Bot import existing book