An edition of Monitoring and control of plasma-enhanced processing of semiconductors (1989)

Monitoring and control of plasma-enhanced processing of semiconductors

proceedings : 1-2 November 1988, Santa Clara, California

by

Cover of: Monitoring and control of plasma-enhanced processing of semiconductors by James E. Griffiths
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Last edited by MARC Bot
July 24, 2024 | History
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An edition of Monitoring and control of plasma-enhanced processing of semiconductors (1989)

Monitoring and control of plasma-enhanced processing of semiconductors

proceedings : 1-2 November 1988, Santa Clara, California

by

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Publish Date
Publisher
SPIE
Language
English
Pages
147

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Previews available in: English

Subjects

Plasma engineering, Semiconductors, Congresses, Vapor plating, Epitaxy, Quality control, Optical methods
Edition Availability
Cover of: Monitoring and control of plasma-enhanced processing of semiconductors
Monitoring and control of plasma-enhanced processing of semiconductors: proceedings : 1-2 November 1988, Santa Clara, California
1989, SPIE
in English

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Book Details

Edition Notes

Includes bibliographical references.

Published in
Bellingham, Wash., USA
Series
SPIE proceedings series ;, v. 1037, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 1037.

Classifications

Dewey Decimal Class
621.381/52
Library of Congress
TK7871.85 .M577 1989

The Physical Object

Pagination
viii, 147 p. :
Number of pages
147

ID Numbers

Open Library
OL2066313M
Internet Archive
isbn_0819400726_1037
ISBN 10
0819400726
LCCN
88063652
OCLC/WorldCat
507855588
Goodreads
5714168

Source records

Scriblio MARC record
Library of Congress MARC record
Internet Archive item record
marc_columbia MARC record

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July 24, 2024 Edited by MARC Bot import existing book
July 28, 2023 Edited by ImportBot import existing book
April 3, 2019 Created by MARC Bot import existing book