Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II

8-9 March 1992, San Jose, California

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Last edited by MARC Bot
April 9, 2019 | History

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II

8-9 March 1992, San Jose, California

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
SPIE
Language
English
Pages
488

Buy this book

Previews available in: English

Book Details


Edition Notes

Includes bibliographical references and index.

Published in
Bellingham, Wash
Series
Proceedings / SPIE--the International Society for Optical Engineering ;, v. 1671, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 1671.

Classifications

Dewey Decimal Class
621.3815/2
Library of Congress
TK7874 .E4834 1992

The Physical Object

Pagination
x, 488 p. :
Number of pages
488

ID Numbers

Open Library
OL1746392M
Internet Archive
isbn_0819408263_1671
ISBN 10
0819408263
LCCN
92060181
Goodreads
7131163

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History

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April 9, 2019 Created by MARC Bot import existing book