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Epitaxy provides readers with a comprehensive treatment of the modern models and modifications of epitaxy, together with the relevant experimental and technological framework. This advanced textbook describes all important aspects of the epitaxial growth processes of solid films on crystalline substrates, including a section on heteroepitaxy. It covers and discusses in details the most important epitaxial growth techniques, which are currently widely used in basic research as well as in manufacturing processes of devices, namely solid-phase epitaxy, liquid-phase epitaxy, vapor-phase epitaxy, including metal-organic vapor-phase epitaxy and molecular-beam epitaxy. Epitaxy's coverage of science and texhnology thin-film is intended to fill the need for a comprehensive reference and text examining the variety of problems related to the physical foundations and technical implementation of epitaxial crystallization. It is intended for undergraduate students, PhD students, research scientists, lecturers and practicing engineers interested in materials science, solid state electronics and crystal growth.
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Subjects
Chemical engineering, Physical organic chemistry, Surfaces (Physics), Crystallography, Physics, Optical materials, Epitaxy, Thin films, Physical and theoretical Chemistry, Characterization and Evaluation of Materials, Industrial Chemistry/Chemical Engineering, Optical and Electronic MaterialsEdition | Availability |
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Epitaxy: Physical Principles and Technical Implementation
2004, Springer Berlin Heidelberg
electronic resource :
in English
364208737X 9783642087370
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