An edition of Photomask and X-Ray Mask Technology VI (1999)

Photomask and X-ray mask technology VI

13-14 April, 1999, Yokohama, Japan

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Cover of: Photomask and X-ray mask technology VI by Hiraoki Morimoto
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Last edited by MARC Bot
July 18, 2024 | History
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An edition of Photomask and X-Ray Mask Technology VI (1999)

Photomask and X-ray mask technology VI

13-14 April, 1999, Yokohama, Japan

by

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Publish Date
Publisher
SPIE
Language
English
Pages
628

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Previews available in: English

Subjects

Masks (electronics), Integrated circuits, X-ray lithography, Microlithography, Optoelectronic devices, Masks, Congresses, Design and construction
Edition Availability
Cover of: Photomask and X-ray mask technology VI
Photomask and X-ray mask technology VI: 13-14 April, 1999, Yokohama, Japan
1999, SPIE
in English
Libraries near you: WorldCat

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Book Details

Edition Notes

Includes bibliographical references and index.

Published in
Bellingham, Wash., USA
Series
SPIE proceedings series ;, v. 3748, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 3748.
Genre
Congresses.

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7872.M3 P4724 1999, TK7872.M3P4724 1999

The Physical Object

Pagination
xiii, 628 p. :
Number of pages
628

ID Numbers

Open Library
OL6897067M
Internet Archive
photomaskxraymas3748unse
ISBN 10
081943230X
LCCN
00699160
OCLC/WorldCat
42467808
Goodreads
4487709

Source records

Better World Books record
Library of Congress MARC record
Internet Archive item record
marc_columbia MARC record

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History

Download catalog record: RDF / JSON
July 18, 2024 Edited by MARC Bot import existing book
September 13, 2020 Edited by MARC Bot import existing book
July 31, 2020 Created by ImportBot import existing book