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Photomask and next-generation lithography mask technology IX: 23-25 April, 2002, Yokohama, Japan
2002, SPIE
in English
0819445177 9780819445179
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Edition Notes
Includes bibliographical references and author index.
Some earlier proceedings have title: Photomask and X-ray mask technology.
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Feedback?August 1, 2020 | Edited by ImportBot | import existing book |
December 5, 2010 | Edited by Open Library Bot | Added subjects from MARC records. |
April 28, 2010 | Edited by Open Library Bot | Linked existing covers to the work. |
December 10, 2009 | Created by WorkBot | add works page |